Review: Machine learning for advancing low-temperature plasma modeling and simulation

J Trieschmann and L Vialetto and T Gergs, JOURNAL OF MICRO- NANOPATTERNING MATERIALS AND METROLOGY-JM3, 22, 041504 (2023).

DOI: 10.1117/1.JMM.22.4.041504

Machine learning has had an enormous impact in many scientific disciplines. It has also attracted significant interest in the field of low-temperature plasma (LTP) modeling and simulation in past years. Its application should be carefully assessed in general, but many aspects of plasma modeling and simulation have benefited substantially from recent developments within the field of machine learning and data-driven modeling. In this survey, we approach two main objectives: (a) we review the state-of-the-art, focusing on approaches to LTP modeling and simulation. By dividing our survey into plasma physics, plasma chemistry, plasma-surface interactions, and plasma process control, we aim to extensively discuss relevant examples from literature. (b) We provide a perspective of potential advances to plasma science and technology. We specifically elaborate on advances possibly enabled by adaptation from other scientific disciplines. We argue that not only the known unknowns but also unknown unknowns may be discovered due to the inherent propensity of data-driven methods to spotlight hidden patterns in data.
(c) 2023 Society of Photo-Optical Instrumentation Engineers (SPIE)

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